In 1901 Aimé Cotton produced experimental holographic gratings, fifty years before the concepts of holography were developed by Gabor. A few decades later, Michelson considered the interferometric generation of diffraction gratings obvious, but recognized that an intense monochromatic light source and a photosensitive material of sufficiently fine granularity did not then exist. In the mid-1960s, ion lasers and photoresists became available; the former provides a strong monochromatic line and the latter is photoactive at the molecular level, rather than at the crystalline level (such as photographic film).
When two sets of coherent equally polarized monochromatic optical plane waves of equal intensity intersect each other, a standing wave pat-tern will be formed in the region of intersection if both sets of waves are of the same wavelength λ (see Figure 4-1). The combined intensity distribution forms a set of straight equally-spaced fringes (bright and darklines). Thus, a photographic plate would record a fringe pattern, since the regions of zero field intensity would leave the film unexposed while the regions of maximum intensity would leave the film maximally exposed. Regions between these extremes, for which the combined intensity is neither maximal nor zero, would leave the film partially exposed. The combined intensity varies sinusoidally with position as the interference pattern is scanned along a line. If the beams are not of equal intensity, the minimum intensity will no longer be zero, thereby decreasing the contrast between the fringes. As a consequence, all portions of the photographic plate will be exposed to some degree.
The centers of adjacent fringes (that is, adjacent lines of maximum intensity) are separated by a distance d, where
d = λ / 2sinθ (4-1)
and θ is the half the angle between the beams. A small angle between the beams will produce a widely spaced fringe pattern (large d), whereas a larger angle will produce a fine fringe pattern. The lower limit for d is λ/2, so for visible recording light, thousands of fringes per millimeter may be formed.
Master holographic diffraction gratings are recorded in photoresist, a material whose intermolecular bonds are either strengthened or weakened by exposure to light. Commercially available photoresists are more sensitive to some wavelengths than others; the recording laser line must be matched to the type of photoresist used. The proper combination of an intense laser line and a photoresist that is highly sensitive to this wavelength will reduce exposure time.
Photoresist gratings are chemically developed after exposure to reveal the fringe pattern. A photoresist may be positive or negative, though the latter is rarely used. During chemical development, the portions of a substrate covered in positive photoresist that have been exposed to light are dissolved, while for negative photoresist the unexposed portions are dissolved. Upon immersion in the chemical developer, a surface relief pattern is formed: for positive photoresist, valleys are formed where the bright fringes were, and ridges where the dark fringes were. At this stage a master holographic grating has been produced; its grooves are sinusoidal ridges. This grating may be coated and replicated like master ruled gratings.