When transmitting ultrafast laser beams through optical components, pulses become chirped and broadened. Our chirped mirrors have negative group delay dispersion to compensate for these pulse broadening effects.
Low phase distortion with negative GDD
RP>99.8% @ 700–900 nm, 5° AOI
Compensate for pulse broadening effects in ultrafast beams
Polished back surface allows transmission at other wavelengths
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chirped-mirrors-for-ultrashort-pulses - Drawings
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Specifications
Wavelength Range
700-900 nm
Diameter
25.0 mm
Material
Fused Silica
Coating Type
Broadband Ultrafast Pulse Coating
Surface Quality
20-10 scratch-dig
Surface Flatness
λ/4 at 632.8 nm
Wedge
< 10 arc min
Angle of Incidence
5°
Clear Aperture
≥ central 80% of diameter
Back Surface
Commercial Polished
Reflectivity
Rp≥ 99.8% @ 700-900 nm
Thickness
6.35 mm
Thickness Tolerance
±0.1 mm
Diameter Tolerance
+0/-0.1 mm
Chamfers
0.3-0.6 mm face width
Chamfers Angle Tolerance
45° ±15°
Features
High Reflectance for 700 to 900 nm Wavelengths
A multi-layer dielectric coating offers a high reflectance of 99.8% from 700 to 900 nm.
Compensate for Pulse Broadening
Our chirped mirrors have negative group delay dispersion to compensate for ultrafast pulses that have been broadened by transmission through optical components. The degree of compensation may be tuned by reflecting beams multiple times between two or more chirped mirrors.
Very Low Third Order Dispersion
These chirped mirrors offer very low third order dispersion (cubic term) across the specified 700 to 900 nm wavelength range.
Clear Quadrant Mirror Mounts Application
To get the most our of your chirped mirrors, it is imperative that you mount them for optimized performance. Mounting into Newport's patented clear quadrant mounts – such as SN100C-F2K or U100-A2K – will create the closest separation between two mirrors to allow for a large number of bounces between elements (U.S. Patents: 6,304,393; 5,930,057, and 6,016,230).
For Use With Spectra-Physics Lasers
These mirrors are ideal to be used with Spectra-Physics Tsunami®, Mai Tai® or Element 2TM lasers.
Fused Silica Substrates
Fused Silica is synthetic amorphous silicon dioxide of extremely high purity. This non-crystalline, colorless silica glass combines a low content of inclusions with high refractive index homogeneity, a very low thermal expansion coefficient, and excellent transmittance in the wavelength regime from UV to NIR. As a result, these mirrors will perform better with temperature fluctuations and is ideal for high-energy laser applications due to its high energy damage threshold. For more information, please see our Optical Materials technical note.
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